Synthesis and characterization of wide bandgap semiconductors doped with terbium for electroluminescent devices

In this work, stoichiometric, structural and light emission properties of amorphous wide bandgap semiconductor materials doped with terbium are presented. The amorphous nature of the thin films was confirmed by X-ray diffraction under grazing incidence. Fourier transform infrared spectroscopy spe...

Descripción completa

Autor Principal: Montañez Huamán, Liz Margarita
Formato: info:eu-repo/semantics/masterThesis
Idioma: Español
Publicado: Pontificia Universidad Católica del Perú 2016
Materias:
Acceso en línea: http://tesis.pucp.edu.pe/repositorio/handle/123456789/6999
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
Sumario: In this work, stoichiometric, structural and light emission properties of amorphous wide bandgap semiconductor materials doped with terbium are presented. The amorphous nature of the thin films was confirmed by X-ray diffraction under grazing incidence. Fourier transform infrared spectroscopy spectra exhibit the formation of oxygen bonded elements and X-ray photoelectron spectroscopy reveals the formation of aluminum oxynitride and silicon oxycarbide as host matrices. The thin films were annealed at temperatures ranging from 300 °C to 1000 °C using a rapid thermal processing furnace. The highest light emission intensity for the case of aluminum oxynitride was obtained for terbium concentrations higher than 1 at% and for the annealing temperature at around 400 °C. Additionally, using the characterized films as active layer first electroluminescence devices were designed and investigated.